Technical Parameters
Vacuum Chamber Diameter | Φ800 / Φ1100 / Φ1350 / Φ1550 |
Ultimate Vacuum | Below 4E-5 Pa |
Leak Rate | ≤5E-9 Pa·m³/s (Helium Leak Rate) / Pressure Holding ≤5 Pa for 12 Hours |
Substrate Rotation Mechanism | Cap-type Umbrella, Flat Plate, Planetary Gear, etc. Optional Automatic Flipping Mechanism |
Crystal Film Thickness Control System | 6 Probes + XTC-3 Film Thickness Monitor |
Optical Film Thickness Monitoring System | GILITEK Optical Control System |
| Vacuum Chamber Diameter | Φ800 / Φ1100 / Φ1350 / Φ1550 |
| Ultimate Vacuum | Below 4E-5 Pa |
| Leak Rate | ≤5E-9 Pa·m³/s (Helium leak rate) / Pressure holding ≤5 Pa for 12 h |
| Substrate Rotation Mechanism | Cap-type umbrella, flat plate, planetary gear, etc. Automatic flipping mechanism optional |
| Crystal Film Thickness Control System | 6 probes + XTC-3 film thickness monitor |
| Optical Film Thickness Monitoring System | GILITEK optical control system |