DWDM100G
Technical Parameters | Unit | Specifications |
CentralWavelength | nm | ITU Grid |
Passband Bandwidth | nm | >=0.42 |
PeakInsertionLoss | dB | <=0.25 |
PassbandInsertionLoss | dB | <=0.5 |
Passband Ripple | dB | <=0.25 |
Stopband Bandwidth | nm | <=1.18 |
ReflectionIsolation@ Passband | dB | >=13.5 |
Stopband Bandwidth Isolation | dB | >=30 |
ThermalWavelength Drift | pm/℃ | <1 |
IncidentAngle(AOI) | degree | 1.8 |
Polarization DependentLoss(PDL) | dB | <=0.05 |
Polarization ModeDispersion(PMD) | PS | <=0.1 |
ArReflectance | % | <=0.2 |
Substrate Material | Customer Specified | |
Dimensions | mm | 1.4*1.4*1.0 (or Customer Specified) |
Scratch/dig | 40/20 | |
WedgeAngle Between TwoSurface | degree | Customer Specified |
Operation Temperature | ℃ | −20~70 |
Storage Temperature | ℃ | −40~85 |
Technical Parameters
| Vacuum Chamber Dimensions | 965.4 mm × 1117.6 mm × 685.8 mm |
| Ultimate Vacuum | Below 4E-5 Pa |
| Leak Rate | ≤5E-9 Pa·m³/s (Helium leak rate) / Pressure holding ≤5 Pa for 12 hours |
| Vacuum Recovery | Reach 3E-4 Pa within 100 mins (without heating) |
| Substrate Rotation Mechanism | Central drive, rotation speed adjustable: 0–1000 rpm |
| Substrate Tray Size | 150 mm or 304 mm (select one) |
| Optical Control System | GILITEK transmission optical control system (laser/white light optional, for any film thickness monitoring) |
| Cathode Targets | ① 2×8" targets + 1×6" target + RF source ② 4×8" dual-target co-sputtering (select one) |